JPH0256343U - - Google Patents

Info

Publication number
JPH0256343U
JPH0256343U JP13638888U JP13638888U JPH0256343U JP H0256343 U JPH0256343 U JP H0256343U JP 13638888 U JP13638888 U JP 13638888U JP 13638888 U JP13638888 U JP 13638888U JP H0256343 U JPH0256343 U JP H0256343U
Authority
JP
Japan
Prior art keywords
plasma
expansion chamber
chamber
microwave
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13638888U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13638888U priority Critical patent/JPH0256343U/ja
Publication of JPH0256343U publication Critical patent/JPH0256343U/ja
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)
JP13638888U 1988-10-19 1988-10-19 Pending JPH0256343U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13638888U JPH0256343U (en]) 1988-10-19 1988-10-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13638888U JPH0256343U (en]) 1988-10-19 1988-10-19

Publications (1)

Publication Number Publication Date
JPH0256343U true JPH0256343U (en]) 1990-04-24

Family

ID=31396850

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13638888U Pending JPH0256343U (en]) 1988-10-19 1988-10-19

Country Status (1)

Country Link
JP (1) JPH0256343U (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012524376A (ja) * 2009-04-16 2012-10-11 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド 幅広リボンビームの生成および制御のための複合型ｉｃｐおよびｅｃｒプラズマ源

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012524376A (ja) * 2009-04-16 2012-10-11 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド 幅広リボンビームの生成および制御のための複合型ｉｃｐおよびｅｃｒプラズマ源

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